Patent

Sheng-Chun Hung, Omkar Nafday, Jason R Haaheim
US Patent App. 12/759,572, 2010

0002 Small, thin conductive lines are an important aspect of modern technology including the electronics industry. Metallic lines are particularly important. A need exists to find betterways to prepare and characterize Small, thin conductive lines, including lines at both the micron and nanometer scales. In many cases, however, it is difficult to achieve desired combinations of properties, including, for example, the ability for an ink to be both (i) processable and capable of being patterned, coupled with (ii) providing good, final prop erties after patterning and processing. Other needs exist in creating lines which are long and have high aspect ratios, which have sub-micron line widths, which are continuous and show high conductivity, which can be prepared by direct write methods, and/or which possess the ability to be addressable.